Deposition of Thin Films and Nanostructures

Research group at Department of Plasma Physics and Technology

People

Meet the Team

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Prof. Petr Vašina

director of the Department of Plasma Physics and Technology and the head of the Research group

vasina(at)physics.muni.cz
ORCID  LinkedIn

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Assoc. Prof. Pavel Souček

Research and development of new types of materials, analysis of deposition process, preparation and analysis of coatings

soucek(at)mail.muni.cz
ORCID LinkedIn Scholar

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Assoc. Prof. Jaroslav Hnilica

Space and time resolved diagostics of plasma, study of plasma instabilities, HiPIMS

hnilica(at)mail.muni.cz
ORCID LinkedIn Scholar

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Dr. Peter Klein

HiPIMS plasma diagnostics using optical emission spectroscopy, high-speed cameras and probes

pklein(at)mail.muni.cz
ORCID LinkedIn Scholar

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Dr. Matej Fekete

Research and development of new types of materials, diagnostics of the deposition process

fekete(at)physics.muni.cz
ORCID LinkedIn Scholar

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Dr. Jaroslav Ženíšek

Ab-initio calculations of coating structure and properties, preparation of thin films, including amourphous metallic glass coatings

jzenisek(at)mail.muni.cz
Scholar

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Dr. Pavel Ondračka

Ab-initio culations of coating structure and properties, such as WBC

ondracka(at)mail.muni.cz
ORCID LinkedIn Scholar

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Dr. Stanislava Debnárová

Diagnostics of PVD processes and preparation and analyses of thin films

debnarova(at)mail.muni.cz
ORCID LinkedIn   Scholar

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Thanka Rajan Senthil Perumal, PhD.

PVD synthesis of high entrophy materials

255372(at)mail.muni.cz
ORCID  Scholar

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Dr. Sahand Behrangi

Industrial deposition and characterization of ternary nitride thin films

behrangi(at)mail.muni.cz

ORCID LinkedIn Scholar

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Mgr. Tereza Schmidtová, Ph.D.

Research and analysis of protectvie coatings, including amouphous metallic glass

tschmidtova(at)sci.muni.cz
ORCID LinkedIn Scholar

Students

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Lukáš Vrána

Research of nitrides stabilized by high enthropy prepared by magnetron sputtering

lvrana(at)mail.muni.cz

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Martin Ondryáš

Understaning of multiplused HiPIMS process, preparation and cahracterization of deposited thin films

484247(at)mail.muni.cz

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Tomáš Rada

Industrial deposition of thin films under the high ionization of sputtered particles

t.rada(at)mail.muni.cz

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Martin Učík

Deposition process using pulsed arc synchronized with substrate bias during deposition of hard AlTiN and AlCrN coatings

540833(at)mail.muni.cz

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Simona Adameová

master student


Study of hysteresis behavior in magnetron sputtering under glancing angle deposition conditions

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Gergely Lelovics

master student

 

Investigation of deposition processes during sputtering of single- and two-component metals

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Tatiana Pitoňáková

master student

 

Complex magnetron sputtering

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Jakub Zatloukal

bachalor student

 

Presparation of high entropy oxides thin films by magnetron sputtering with high power pulses

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