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Čeština

Deposition of Thin Films and Nanostructures

Research group at Department of Plasma Physics and Technology

Publications

Summary of academic publications coming from the PVD LAB

K. Bernátová, M. Fekete, P. Klein, J. Hnilica, P. Vašina

Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS

In this paper, the ground state number densities of titanium atom and ion, ionised density fraction and ionised flux fraction were determined. The effective branching fractions method was utilised to evaluate the number densities of sputtered species. The highest ionised density fraction of 90% was reached in the target region for 1.2% duty cycle. In the substrate region for a duty cycle below 2%, the ionised density fraction always reached at least 50%.

Plasma Sources Science and Technology 29 (2020) 055010

M. Kroker, P. Souček, M. Šlapanská, V. Sochora, M. Jílek, P. Vašina

Predicting the composition of W-B-C coatings sputtered from industrial cylindrical segmented target

This work presents an approach for the prediction of the composition and the deposition rate of the coatings. The simulated chemical composition and the relative deposition rate were verified and validated by experiments. A correlation between the chemical composition and target segment placement is presented, and the influence of substrate movement on the chemical composition is discussed. The simulations uncover the distinct trajectories of the heavy and light particles.

Surface and Coatings Technology 438 (2022) 128411

M. Šlapanská, M. Kroker, P. Klein, J. Hnilica, P. Vašina

Spatially resolved study of spokes in reactive HiPIMS discharge

This contribution gives an insight into the spokes in the Ar–N2 atmosphere using the Ti target. The aim is to describe not only the global parameters of spokes, such as their shape, length, and propagation velocity but also provide a description of parameters evolving over the spoke, such as floating potential and spectral emission. The measurements of the latter clearly showed which species emission is most prominent and how it changes with the transition from argon discharge towards the discharge driven in a pure nitrogen atmosphere.

Plasma Sources Science and Technology 31 (2022) 055010

P. Souček, J. Hnilica, P. Klein, M. Fekete, P. Vašina

Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS

In this paper, standard single-pulse HiPIMS (s-HiPIMS), multipulse HiPIMS (m-HiPIMS), and conventional direct current magnetron sputtering were employed to deposit metallic Ti coatings. Varying the number of pulses in one pulse sequence in m-HiPIMS operation enables to influence the ion fluxes on the substrate and the ionisation of the sputtered titanium. By the use of m-HiPIMS, it was possible to achieve coatings with a smoother surface morphology and lower roughness. The texture and the deposition rate were significantly affected by the number of pulses, too.

Surface and Coatings Technology 423 (2021) 127624

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Total number of publications: 17

Articles

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