Deposition of Thin Films and Nanostructures
Research group at the Department of Plasma Physics and Technology
Our research group, Deposition of Thin Films and Nanostructures specializes in preparing thin films and nanomaterials using plasma. We focus on PVD (Physical Vapor Deposition) techniques with an emphasis on magnetron sputtering and HiPIMS (High-Power Impulse Magnetron Sputtering), PECVD (Plasma Enhanced Chemical Vapor Deposition) techniques, and also microwave and high-frequency methods of advanced nanomaterials preparation.
Our work includes the design of new materials and manufacturing processes, plasma deposition diagnostics, process simulation, theoretical modeling of material properties, and analysis of prepared layers and nanomaterials. We characterize the synthesized thin films and nanomaterials' composition, morphology, crystal structure, chemical bonding, electrical, optical, mechanical, and functional properties.
Our team
Prof. Petr Vašina
director of the Department of Plasma Physics and Technology
Dr. Jaroslav Ženíšek
Ab-initio calculations of coating structure and properties, preparation of thin films, including amourphous metallic glass coatings
jzenisek(at)mail.muni.cz
Scholar
Ph.D. students
Ondrej Kubinec
Development and study of materials with thermoelectric properties
500240(at)mail.muni.cz
Richard Václavik
Research of nanostructured plazma-polymer thin films deposited in dusty plasma
451769(at)mail.muni.cz
Lukáš Vrána
Research of nitrides stabilized by high enthropy prepared by magnetron sputtering
lvrana(at)mail.muni.cz
Want to join our research? Contact us. We collaborate with scientific organizations from all over the world and with companies focusing on PVD technologies. Applications of our coatings and nanomaterials include:
- mechanical protective coatings – mechanical engineering
- flexible electronics
- optoelectronics
- aerospace and automotive
- hydrogen and electrical energy storage
- sensors
Novinky a články
